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Journal of Materials Science - 巻 53 / 号 21

タイトル
著者 ページ PKV
Effect of surfactants on the properties of a gas-sealing coating modified with fly ash and cement
Huiping Song, Wensheng Xie, Maohong Fan 53 21 15142–15156 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Compressional stability of optical fibres: a combined experimental and computer study
Lukas Capek, Petr Henys, Brigita Kolcavova 53 21 15157–15164 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Correlation between three-dimensional and cross-sectional characteristics of ideal grain growth: large-scale phase-field simulation study
Eisuke Miyoshi, Tomohiro Takaki, Takayuki Aoki 53 21 15165–15180 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
A crystallographic study on the growth of Laves phase MgZn2 during the solidification process of Zn–Mg alloy under a high magnetic field
Lei Li, Chunyan Ban, Jianzhong Cui 53 21 15181–15195 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Preparation of Y3Al5O12:Ce nanophosphors using salt microemulsion method and their luminescent properties
Li Song, Yan Dong, Jianqing Jiang 53 21 15196–15203 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Metallized nanoporous anodic alumina films and their applications
G. A. Lyubas 53 21 15204–15212 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Charge transport properties of pyrene and its derivatives: optoelectronic and nonlinear optical applications
U. Reeta Felscia, Beulah J. M. Rajkumar, M. Briget Mary 53 21 15213–15225 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
HAADF-STEM for the analysis of core–shell quantum dots
N. Fernández-Delgado, M. Herrera, S. I. Molina 53 21 15226–15236 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
Structural and electrical properties of Ge-doped ZrO2 thin films grown by atomic layer deposition for high-k dielectrics
Bo-Eun Park, Yujin Lee, Hyungjun Kim 53 21 15237–15245 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)
N-doped and Fe-, N-codoped carbon: tuning of porous structures for highly efficient oxygen reduction reaction
Lu Xiao, Qianqian Yang, Zidong Wei 53 21 15246–15256 2018 0.0
平均評価: 0.0 / 5 (0 件のレビュー)