Relationship between nano-architectured Ti1−x Cu x thin film and electrical resistivity for resistance temperature detectors
['A. Ferreira', 'J. Borges', 'F. Vaz']
/
Journal of Materials Science
/ Vol. 52
/ No. 9
0.0 / 5
0
Reviews
You must log in to post, edit and delete a review.
Log in
Earn 50 points when your review is published.
About KnowledgeRank Points
No reviews have been posted yet. Be the first to write one!