Structural and dielectric properties of ion beam deposited titanium oxynitride thin films
['Liuwei Jia', 'Huiping Lu', 'Zhi Wang']
/
Journal of Materials Science
/ Vol. 54
/ No. 2
0.0 / 5
0
Reviews
You must log in to post, edit and delete a review.
Log in
Earn 50 points when your review is published.
About KnowledgeRank Points
No reviews have been posted yet. Be the first to write one!