Vieta–Lucas polynomials-based collocation simulation to analyze the solvent fraction factor in active and passive control flow induced by torsional motion
['Ravikumar Shashikala Varun Kumar', 'Rangaswamy Naveen Kumar', 'Mavinakere Eshwaraiah Raghunandan', 'Ballajja Chandrappa Prasannakumara']
/
Physics of Fluids
/ Vol. 36
/ No. 11
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