Analysis of Oxidized Film Formation and Evaluation of Intrinsic Stress in the a-Si Layer of Semiconductor Microscopic Patterned Structures Using Molecular Dynamics Method
['Hiro TANAKA', 'Masaru INOUE', 'So TAKAMOTO', 'Asuka HATANO', 'Satoshi IZUMI']
/
Journal of the Society of Materials Science, Japan
/ Vol. 65
/ No. 2
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