Wafer Flatness Measurement System with Sub-Nanometer Precision Cancelling the Noise Caused by a Light Source Using Dual Heterodyne Interferometer
['Kazuhiko TAHARA', 'Hideki MATSUOKA', 'Masato KANNAKA', 'Takashi KITA']
/
Journal of the Society of Materials Science, Japan
/ Vol. 67
/ No. 9
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